Multilayered ZnO Films of Improved Quality Deposited by Magnetron Sputtering

• Authors: A. Ievtushenko , V. Karpyna , G. Lashkarev , V. Lazorenko , V. Baturin , A. Karpenko , M. Lunika , A. Dan'ko
• Languages of publication: EN

Abstracts

EN

Multilayered ZnO films were deposited by rf magnetron sputtering on silicon and sapphire substrates. The aim of this work is to improve structural quality of ZnO thin films grown on just listed substrates. Presented X-ray diffraction data testify to remarkable relaxation of compressive stress in two- and three-layered ZnO films in comparison with single-layer one.

Keywords

EN

81.05.Dz; 81.15.Cd; 61.05.cp; 68.55.jm

Discipline

• 68.55.jm: Texture
• 61.05.cp: X-ray diffraction
• 81.05.Dz: II-VI semiconductors
• 81.15.Cd: Deposition by sputtering

• Journal: Acta Physica Polonica A
• Year: 2008
• Volume: 114
• Issue: 5
• Pages: 1131-1137

Dates

published

2008-11

received

2008-06-07

Contributors

author

A. Ievtushenko

• Institute for Problems of Material Science, NASU, 3 Krzhizhanovskogo st., Kiev, 03680, Ukraine

author

V. Karpyna

• Institute for Problems of Material Science, NASU, 3 Krzhizhanovskogo st., Kiev, 03680, Ukraine

author

G. Lashkarev

• Institute for Problems of Material Science, NASU, 3 Krzhizhanovskogo st., Kiev, 03680, Ukraine

author

V. Lazorenko

• Institute for Problems of Material Science, NASU, 3 Krzhizhanovskogo st., Kiev, 03680, Ukraine

author

V. Baturin

• Institute of Applied Physics, NASU, 58 Petropavlovskaya st., Sumy, 40030, Ukraine

author

A. Karpenko

• Institute of Applied Physics, NASU, 58 Petropavlovskaya st., Sumy, 40030, Ukraine

author

M. Lunika

• Institute of Applied Physics, NASU, 58 Petropavlovskaya st., Sumy, 40030, Ukraine

author

A. Dan'ko

• SSI 'Institute for Single Crystals', NASU, 60 Lenin Ave., Kharkov, 61001, Ukraine

References

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Identifiers

DOI

10.12693/APhysPolA.114.1131