Deposition of Amorphous Hydrogenated Carbon Coatings by Plasma Jet

• Authors: L. Marcinauskas , A. Grigonis , H. Manikowski , V. Valincius
• Languages of publication: EN

Abstracts

EN

In this study amorphous hydrogenated carbon films (a-C:H) were formed on Si (111) from an Ar-C_2H_2 and Ar-C_2H_2-H_2 gas mixtures at 1000 Pa pressure using a plasma jet chemical vapour deposition. It is shown that by varying the Ar:C_2H_2 ratio and adding the hydrogen gas in plasma, the structure, surface morphology, growth rate of the coatings, and consequently their optical properties can be controlled.

Keywords

EN

81.15.-z; 81.05.Uw; 78.30.-j

Discipline

• 78.30.-j: Infrared and Raman spectra(for vibrational states in crystals and disordered systems, see 63.20.-e and 63.50.-x, respectively; for Raman spectra of superconductors, see 74.25.nd)
• 81.15.-z: Methods of deposition of films and coatings; film growth and epitaxy(for structure of thin films, see 68.55.-a; see also 85.40.Sz Deposition technology in microelectronics; for epitaxial dielectric films, see 77.55.Px)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2008
• Volume: 113
• Issue: 3
• Pages: 1063-1066

Dates

published

2008-03

received

2007-08-26

Contributors

author

L. Marcinauskas

• Lithuanian Energy Institute, Breslaujos st. 3, LT-44403, Kaunas, Lithuania
• Kaunas University of Technology, Physics Department, Studentu st. 50, LT-51368, Kaunas, Lithuania

author

A. Grigonis

• Kaunas University of Technology, Physics Department, Studentu st. 50, LT-51368, Kaunas, Lithuania

author

H. Manikowski

• PoznańUniversity of Technology, Institute of Physics, Piotrowo 3, PL-60-965, Poznań, Poland

author

V. Valincius

• Lithuanian Energy Institute, Breslaujos st. 3, LT-44403, Kaunas, Lithuania

References

• 1. J. Robertson, Mater. Sci. Eng. 37, 129 (2002)
• 2. S.A. Smallwood, K.C. Eapen, S.T. Patton, J.S. Zabinski, Wear 260, 1179 (2006)
• 3. M. Terrones, Ann. Rev. Mater. Res. 33, 419 (2003)
• 4. L. Marcinauskas, A. Grigonis, V. Kulikauskas, V. Valincius, Vacuum 81, 1220 (2007)
• 5. S.P. Louch, C.H. Wong, M.H. Hon, Thin Solid Films 498, 235 (2006)
• 6. J. Benedikt, K.G.Y. Letourneur, M. Wisse, D.C. Schram, M.C.M. van de Sanden, Diamond Relat. Mater. 11, 989 (2002)

Identifiers

DOI

10.12693/APhysPolA.113.1063