PL EN


Preferences help
enabled [disable] Abstract
Number of results
2008 | 113 | 3 | 1063-1066
Article title

Deposition of Amorphous Hydrogenated Carbon Coatings by Plasma Jet

Content
Title variants
Languages of publication
EN
Abstracts
EN
In this study amorphous hydrogenated carbon films (a-C:H) were formed on Si (111) from an Ar-C_2H_2 and Ar-C_2H_2-H_2 gas mixtures at 1000 Pa pressure using a plasma jet chemical vapour deposition. It is shown that by varying the Ar:C_2H_2 ratio and adding the hydrogen gas in plasma, the structure, surface morphology, growth rate of the coatings, and consequently their optical properties can be controlled.
Keywords
EN
Contributors
  • Lithuanian Energy Institute, Breslaujos st. 3, LT-44403, Kaunas, Lithuania
  • Kaunas University of Technology, Physics Department, Studentu st. 50, LT-51368, Kaunas, Lithuania
author
  • Kaunas University of Technology, Physics Department, Studentu st. 50, LT-51368, Kaunas, Lithuania
author
  • PoznańUniversity of Technology, Institute of Physics, Piotrowo 3, PL-60-965, Poznań, Poland
author
  • Lithuanian Energy Institute, Breslaujos st. 3, LT-44403, Kaunas, Lithuania
References
  • 1. J. Robertson, Mater. Sci. Eng. 37, 129 (2002)
  • 2. S.A. Smallwood, K.C. Eapen, S.T. Patton, J.S. Zabinski, Wear 260, 1179 (2006)
  • 3. M. Terrones, Ann. Rev. Mater. Res. 33, 419 (2003)
  • 4. L. Marcinauskas, A. Grigonis, V. Kulikauskas, V. Valincius, Vacuum 81, 1220 (2007)
  • 5. S.P. Louch, C.H. Wong, M.H. Hon, Thin Solid Films 498, 235 (2006)
  • 6. J. Benedikt, K.G.Y. Letourneur, M. Wisse, D.C. Schram, M.C.M. van de Sanden, Diamond Relat. Mater. 11, 989 (2002)
Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv113n363kz
JavaScript is turned off in your web browser. Turn it on to take full advantage of this site, then refresh the page.