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2008 | 113 | 3 | 1055-1058

Article title

Study of p-Fe₃O₄/n-(GaAs,Si) Heterostructures: Fabrication and Physical Properties

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Languages of publication

EN

Abstracts

EN
We report preparation and investigation of p -n heterostructures based on Fe₃O₄ thin films grown on semiconductor Si and GaAs substrates. Fe₃O₄ films with thickness ranging from 60 to 300 nm were grown at 350÷450°C using dc magnetron sputtering technique. The measurement of X-ray diffraction and reflection high energy electron diffraction revealed polycrystalline microstructure of thin Fe₃O₄ films deposited on both Si and GaAs substrate. Investigation of surface composition by X-ray photoelectron spectroscopy showed that Fe 2p peak consists of three main peaks, namely, metallic iron Fe(0), Fe(II), and Fe(III). Transport measurements of Fe₃O₄/n-(Si, GaAs) heterostructures demonstrated nonlinear current-voltage (I -V) dependences in the temperature range from 300 K to 78 K.

Keywords

EN

Contributors

author
  • Semiconductor Physics Institute, Goštauto 11, LT-01108 Vilnius, Lithuania
author
  • Semiconductor Physics Institute, Goštauto 11, LT-01108 Vilnius, Lithuania
author
  • Semiconductor Physics Institute, Goštauto 11, LT-01108 Vilnius, Lithuania
  • Semiconductor Physics Institute, Goštauto 11, LT-01108 Vilnius, Lithuania
  • Institute of Physical Electronics of Kaunas University of Technology, Savanoriu 271, Kaunas, Lithuania
  • Institute of Physical Electronics of Kaunas University of Technology, Savanoriu 271, Kaunas, Lithuania
  • Institute of Physical Electronics of Kaunas University of Technology, Savanoriu 271, Kaunas, Lithuania

References

  • 1. D.C. Kundaliya, S.B. Ogale, L.F. Fu, S.J. Welz, J.S. Higgins, G. Langham, S. Dhar, N.D. Browning, T. Venkatesan, J. Appl. Phys. 99, 08K304 (2006)
  • 2. M. Ziese, U. Köhler, A. Bollero, R. Höhne, P. Esquinazi, Phys. Rev. B 71, 180406(R) (2005)

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bwmeta1.element.bwnjournal-article-appv113n361kz
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