Microstructural Analysis and Transport Properties of RuO_2-Based Thick Film Resistors

• Authors: S. Gabáni , K. Flachbart , V. Pavlík , A. Pietriková , M. Gabániová
• Languages of publication: EN

Abstracts

EN

RuO_2-based low temperature sensors appear as very good secondary thermometers, mainly in the temperature range below 4.2 K. This is due to their high temperature sensitivity and small magnetoresistance. Both properties are strongly influenced by the manufacturing process (mainly by firing temperature and firing time). In our contribution we show that the microstructure of sensors and the temperature dependence of their resistance R(T) down to 50 mK, in case when all sensors are prepared from the same paste, can be strongly influenced by change of the firing temperature from 800°C to 900°C. The paper also presents results on the X-ray microanalysis and the analysis of electrical conductivity of these sensors.

Keywords

EN

85.40.Xx; 72.80.-r; 73.40.Rw

Discipline

• 72.80.-r: Conductivity of specific materials(for conductivity of metals and alloys, see 72.15.-v)
• 85.40.Xx: Hybrid microelectronics; thick films
• 73.40.Rw: Metal-insulator-metal structures

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2008
• Volume: 113
• Issue: 1
• Pages: 625-628

Dates

published

2008-01

received

2007-07-09

Contributors

author

S. Gabáni

• Institute of Experimental Physics, Slovak Academy of Sciences, Watsonova 47, 04001 Košice, Slovakia

author

K. Flachbart

• Institute of Experimental Physics, Slovak Academy of Sciences, Watsonova 47, 04001 Košice, Slovakia

author

V. Pavlík

• Institute of Experimental Physics, Slovak Academy of Sciences, Watsonova 47, 04001 Košice, Slovakia

author

A. Pietriková

• Department of Technologies in Electronics, Faculty of Electrical Engineering and Informatics, TU Košice, 04200 Košice, Slovakia

author

M. Gabániová

• Research and Development, U.S. Steel Košice, s.r.o., 04454 Košice, Slovakia

References

• 1. L.G. Rubin, Cryogenics 37, 341 (1997)
• 2. I. Bat'ko, K. Flachbart, M. Somora, D. Vanický, Cryogenics 35, 105 (1995)
• 3. N. Nicoloso, A. LeCorre-Frisch, J. Maier, R. J. Brook, Solid State Ionics 75, 211 (1995)
• 4. T. Yamaguchi, Y. Nakamura, J. Am. Ceram. Soc. 78, 1372 (1995)
• 5. K. Flachbart, V. Pavlík, N. Tomašovičová, C.J. Adkins, M. Somora, J. Leib, G. Eska, Physica Status Solidi B 205, 399 (1998)
• 6. K. Bobran, A. Kusy, A.W. Stadler, G. Wilczynski, Int. J. Electron. 78, 113 (1995)
• 7. S. Gabáni, V. Pavlík, K. Flachbart, J. Varga, A. Pietriková, Czech. J. Phys. 54, D663 (2004)

Identifiers

DOI

10.12693/APhysPolA.113.625