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2008 | 113 | 1 | 625-628
Article title

Microstructural Analysis and Transport Properties of RuO_2-Based Thick Film Resistors

Content
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Languages of publication
EN
Abstracts
EN
RuO_2-based low temperature sensors appear as very good secondary thermometers, mainly in the temperature range below 4.2 K. This is due to their high temperature sensitivity and small magnetoresistance. Both properties are strongly influenced by the manufacturing process (mainly by firing temperature and firing time). In our contribution we show that the microstructure of sensors and the temperature dependence of their resistance R(T) down to 50 mK, in case when all sensors are prepared from the same paste, can be strongly influenced by change of the firing temperature from 800°C to 900°C. The paper also presents results on the X-ray microanalysis and the analysis of electrical conductivity of these sensors.
Keywords
EN
Year
Volume
113
Issue
1
Pages
625-628
Physical description
Dates
published
2008-01
received
2007-07-09
References
  • 1. L.G. Rubin, Cryogenics 37, 341 (1997)
  • 2. I. Bat'ko, K. Flachbart, M. Somora, D. Vanický, Cryogenics 35, 105 (1995)
  • 3. N. Nicoloso, A. LeCorre-Frisch, J. Maier, R. J. Brook, Solid State Ionics 75, 211 (1995)
  • 4. T. Yamaguchi, Y. Nakamura, J. Am. Ceram. Soc. 78, 1372 (1995)
  • 5. K. Flachbart, V. Pavlík, N. Tomašovičová, C.J. Adkins, M. Somora, J. Leib, G. Eska, Physica Status Solidi B 205, 399 (1998)
  • 6. K. Bobran, A. Kusy, A.W. Stadler, G. Wilczynski, Int. J. Electron. 78, 113 (1995)
  • 7. S. Gabáni, V. Pavlík, K. Flachbart, J. Varga, A. Pietriková, Czech. J. Phys. 54, D663 (2004)
Document Type
Publication order reference
YADDA identifier
bwmeta1.element.bwnjournal-article-appv113n1152kz
Identifiers
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