PL EN


Preferences help
enabled [disable] Abstract
Number of results
2008 | 113 | 1 | 171-174
Article title

Investigation of the Morphological Structure of Thin Cobalt Films by AFM and TEM

Content
Title variants
Languages of publication
EN
Abstracts
EN
Thin obalt films, 40 nm and 100 nm in thickness, were evaporated at an incidence angle of 45° in a vacuum of about 10^{-5} mbar, simultaneously on unheated glass substrates and NaCl crystals. The magnetic microstructure of these films was investigated in a previous paper. In the present paper, to obtain an insight into relation between the magnetic microstructure and the morphological structure, we studied the latter structure with atomic force microscopy and transmission electron microscopy. For the films 40 nm as well as 100 nm thick, the presence of contribution of the shape anisotropy (related to the geometric alignment of the grains of the film) to the magnetic anisotropy of the film was found. Nevertheless, for the films investigated, we could not detect crystallographic texture.
Keywords
EN
Year
Volume
113
Issue
1
Pages
171-174
Physical description
Dates
published
2008-01
received
2007-07-09
References
  • 1. W. Szmaja, J. Balcerski, Czech. J. Phys. 54, Suppl. D (20D245) 04
  • 2. K. Itoh, K. Okamoto, T. Hashimoto, J. Magn. Magn. Mater. 190, 176 (1998)
  • 3. A. Lisfi, J.C. Lodder, H. Wormeester, B. Poelsema, Phys. Rev. B 66, 174420 (2002)
  • 4. F. Liu, M.T. Umlor, L. Shen, J. Weston, W. Eads, J.A. Barnard, G.J. Mankey, J. Appl. Phys. 85, 5486 (1999)
  • 5. T. Otiti, J. Mater. Sci. 38, 1315 (2003)
  • 6. K. Hara, K. Itoh, M. Kamiya, K. Okamoto, T. Hashimoto, J. Magn. Magn. Mater. 161, 287 (1996 )
Document Type
Publication order reference
YADDA identifier
bwmeta1.element.bwnjournal-article-appv113n1042kz
Identifiers
JavaScript is turned off in your web browser. Turn it on to take full advantage of this site, then refresh the page.