Newly Developed Systems for the Magnetostrictive Materials Strain Measurements

• Authors: K. Kuczyński , A. Bieńkowski , L. Salbut , G. Dymny
• Languages of publication: EN

Abstracts

EN

Magnetostrictive effect is connected with changes of the dimension of soft magnetic materials during the process of theirs magnetization. The paper presents newly developed measuring systems for testing of the strain distribution in the magnetostrictive materials. The system uses simultaneously two measurement techniques: strain-gauge sensor for local strain measurement and grating interferometry for the global determination of strain distribution.

Keywords

EN

75.80.+q; 42.50.St; 07.10.Pz; 07.60.Ly

Discipline

• 42.50.St: Nonclassical interferometry, subwavelength lithography
• 07.60.Ly: Interferometers
• 07.10.Pz: Instruments for strain, force, and torque
• 75.80.+q: Magnetomechanical effects, magnetostriction(for magnetostrictive devices, see 85.70.Ec)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2008
• Volume: 113
• Issue: 1
• Pages: 71-74

Dates

published

2008-01

received

2007-07-09

Contributors

author

K. Kuczyński

• Institute of Metrology and Measurement Systems, Warsaw University of Technology, św. A. Boboli 8, 02-525 Warsaw, Poland

author

A. Bieńkowski

• Institute of Metrology and Measurement Systems, Warsaw University of Technology, św. A. Boboli 8, 02-525 Warsaw, Poland

author

L. Salbut

• Institute of Micromechanics and Photonics, Warsaw University of Technology, św. A. Boboli 8, 02-525 Warsaw, Poland

author

G. Dymny

• Institute of Micromechanics and Photonics, Warsaw University of Technology, św. A. Boboli 8, 02-525 Warsaw, Poland

References

• 1. R. O'Handley, Modern Magnetic Materials: Principles and Applications, Wiley, New York 2000
• 2. G. Vlasák, J. Magn. Magn. Mater. 215-216, 479 (2000)
• 3. D. Post, B. Han, P. Ifju, High Sensitivity Moiré, Springer-Verlag, 1994
• 4. K. Patorski, M. Kujawiska, L. Salbut, Interferometria Laserowa z Automatyczną Analizą Obrazu, Oficyna Wydawnicza Politechniki Warszawskiej, Warszawa 2005
• 5. K. Kuczyński, A. Bieńkowski, R. Szewczyk, in: Proc. 14th IMEKO TC4 Symp. , Gdynia/Jurata 2005, p. 434

Identifiers

DOI

10.12693/APhysPolA.113.71