Positron Implantation Profile in Kapton

• Authors: J. Dryzek , E. Dryzek
• Languages of publication: EN

Abstracts

EN

The discussion presented in the paper focuses on processes accompanying positron implantation in condensed matter. They finally constitute the positron implantation profile which generally does not exhibit the exponential behavior as it is concluded from the Monte Carlo simulation made using the EGSnrc 4.0 code. The simulation was performed for the kapton and two commonly used positron sources ^{22}Na and ^{68}Ge/g^{68}Ga. New formula for the implantation profile was proposed.

Keywords

EN

78.70.-g  

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2006
• Volume: 110
• Issue: 5
• Pages: 577-582

Dates

published

2006-11

received

2006-06-05

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Identifiers

DOI

10.12693/APhysPolA.110.577