Microstructure of the Pulsed Laser Deposited LaSrCuO Films

• Authors: M Cieplak , A Abal'oshev , I Zaytseva , M Berkowski , S Guha , Q Wu
• Languages of publication: EN

Abstracts

EN

The X-ray diffraction and atomic force microscopy are used to examine the microstructure of La_{1.85}Sr_{0.15}CuO_4 films grown by pulsed laser deposition on LaSrAlO_4 substrates. The films grow with different degrees of built-in strain, ranging from a large compressive to a large tensile in-plain strain. The tensile strain cannot be attributed to a substrate-related strain. The possible origins of the tensile strain are discussed.

Keywords

EN

68.55.-a; 68.55.Jk; 68.37.Ps

Discipline

• 68.37.Ps: Atomic force microscopy (AFM)
• 68.55.-a: Thin film structure and morphology(for methods of thin film deposition, film growth and epitaxy, see 81.15.-z)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2006
• Volume: 109
• Issue: 4-5
• Pages: 573-576

Dates

published

2006-04

received

2005-09-25

Contributors

author

M Cieplak

• Instytut Fizyki Polskiej Akademii Nauk, al. Lotników 32/46, 02-668 Warszawa, Poland

author

A Abal'oshev

• Instytut Fizyki Polskiej Akademii Nauk, al. Lotników 32/46, 02-668 Warszawa, Poland

author

I Zaytseva

• Instytut Fizyki Polskiej Akademii Nauk, al. Lotników 32/46, 02-668 Warszawa, Poland

author

M Berkowski

• Instytut Fizyki Polskiej Akademii Nauk, al. Lotników 32/46, 02-668 Warszawa, Poland

author

S Guha

• Department of Physics and Astronomy, Rutgers University, Piscataway, NJ 08851, USA

author

Q Wu

• Department of Physics and Astronomy, Rutgers University, Piscataway, NJ 08851, USA

References

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Identifiers

DOI

10.12693/APhysPolA.109.573