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Number of results
2005 | 107 | 5 | 842-847

Article title

Amorphous Carbon Thin Films Deposited on Si and PET: Study of Interface States

Content

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EN

Abstracts

EN
Thin carbon films with various thicknesses, deposited on different substrates (Si and poly-ethylene-terephthalate) at the same operating conditions in a radio frequency plasma enhanced chemical vapour deposition system were characterized by Doppler broadening spectroscopy. The films and the substrates were depth profiled by a slow positron beam. The aim of these measurements was to study the open volume structure and the interface of the films. It was found that, independently from the substrate, the films were homogeneous and exhibited the same open volume distribution. On the contrary, the effective positron diffusion length in the Si substrate was found to change with the thickness of the carbon films. This behaviour was interpreted as a change in the electric field at the carbon/silicon interface.

Keywords

Contributors

author
  • Dipartimento di Fisica, Universitá di Trento, 38050 Povo (Tn), Italy
author
  • Dipartimento di Fisica, Universitá di Trento, 38050 Povo (Tn), Italy
author
  • Dipartimento di Fisica, Universitá di Trento, 38050 Povo (Tn), Italy
author
  • Dipartimento di Fisica, Universitá di Trento, 38050 Povo (Tn), Italy
author
  • ITC-Istituto per la Ricerca Scientifica e Tecnologica, Divisione Fisica-Chimica delle Superfici ed Interfacce, 38050 Povo, Italy
author
  • ITC-Istituto per la Ricerca Scientifica e Tecnologica, Divisione Fisica-Chimica delle Superfici ed Interfacce, 38050 Povo, Italy
author
  • ITC-Istituto per la Ricerca Scientifica e Tecnologica, Divisione Fisica-Chimica delle Superfici ed Interfacce, 38050 Povo, Italy
author
  • ITC-Istituto per la Ricerca Scientifica e Tecnologica, Divisione Fisica-Chimica delle Superfici ed Interfacce, 38050 Povo, Italy

References

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Document Type

Publication order reference

Identifiers

YADDA identifier

bwmeta1.element.bwnjournal-article-appv107n520kz
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