Diffusion of Palladium on Tantalum Microcrystal

• Authors: G. Antczak , R. Błaszczyszyn
• Languages of publication: EN

Abstracts

EN

Surface diffusion of palladium,Θ=2 ML, on a tantalum microcrystal was studied by means of field electron emission microscopy within the temperature range 665-790 K. The observed sharp moving boundary-diffusion proceeds with an activation energy ranging from 1.25 to 1.7 eV/atom, depending on the crystallographic direction.

Keywords

EN

79.70.+q; 68.37.Vj; 68.43.Jk; 05.40.Ca

Discipline

• 05.40.Ca: Noise
• 79.70.+q: Field emission, ionization, evaporation, and desorption
• 68.43.Jk: Diffusion of adsorbates, kinetics of coarsening and aggregation
• 68.37.Vj: Field emission and field-ion microscopy

• Journal: Acta Physica Polonica A
• Year: 2003
• Volume: 103
• Issue: 1
• Pages: 57-65

Dates

published

2003-01

received

2002-07-05

Contributors

author

G. Antczak

• Institute of Experimental Physics, University of Wrocław, pl. M. Borna 9, 50-204 Wrocław, Poland

author

R. Błaszczyszyn

• Institute of Experimental Physics, University of Wrocław, pl. M. Borna 9, 50-204 Wrocław, Poland

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Identifiers

DOI

10.12693/APhysPolA.103.57