Nanoimaging Using Soft X-Ray and EUV Sources Based on Double Stream Gas Puff Targets

• Authors: P. Wachulak , A. Torrisi , M. Ayele , A. Bartnik , Ł. Węgrzyński , T. Fok , J. Czwartos , H. Fiedorowicz
• Languages of publication: EN

Abstracts

EN

In this work we present recent results on nanoscale imaging in the extreme ultraviolet and soft X-ray spectral ranges, describing three novel imaging systems dedicated for high spatial resolution imaging of nanoscale objects with the extreme ultraviolet and soft X-ray radiations. The extreme ultraviolet and soft X-ray full field microscopes operate at 13.8 nm and 2.88 nm wavelengths and are capable of imaging of nanostructures with a sub-50 nm spatial resolution. A soft X-ray contact microscope operates in the "water-window" spectral range from 2.3 to 4.4 nm wavelength, to obtain images of an internal structure of the investigated object in a thin surface layer of soft X-ray light sensitive photoresist. The development of such compact imaging systems may, in the near future, be important from the point of view of new research related to biological, material science, and nanotechnology applications. Such preliminary applications are also shown in the studies of biological samples, including carcinoma cells, diatoms, and neurons.

Keywords

EN

gas puff target; Fresnel zone plates; EUV/SXR microscopy; contact microscopy; imaging; nanometer resolution

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2018
• Volume: 133
• Issue: 2
• Pages: 271-276

Dates

published

2018-02

Contributors

author

P. Wachulak

• Institute of Optoelectronics, Military University of Technology, S. Kaliskiego 2, 00-908 Warsaw, Poland

author

A. Torrisi

• Institute of Optoelectronics, Military University of Technology, S. Kaliskiego 2, 00-908 Warsaw, Poland

author

M. Ayele

• Institute of Optoelectronics, Military University of Technology, S. Kaliskiego 2, 00-908 Warsaw, Poland

author

A. Bartnik

• Institute of Optoelectronics, Military University of Technology, S. Kaliskiego 2, 00-908 Warsaw, Poland

author

Ł. Węgrzyński

• Institute of Optoelectronics, Military University of Technology, S. Kaliskiego 2, 00-908 Warsaw, Poland

author

T. Fok

• Institute of Optoelectronics, Military University of Technology, S. Kaliskiego 2, 00-908 Warsaw, Poland

author

J. Czwartos

• Institute of Optoelectronics, Military University of Technology, S. Kaliskiego 2, 00-908 Warsaw, Poland

author

H. Fiedorowicz

• Institute of Optoelectronics, Military University of Technology, S. Kaliskiego 2, 00-908 Warsaw, Poland

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Identifiers

DOI

10.12693/APhysPolA.131.271