The new method of fabrication of submicron structures by optical lithography with mask shifting and mask rotation

• Authors: Kornelia Indykiewicz , Marcin Hajłasz , Bogdan Paszkiewicz
• Languages of publication: EN

Abstracts

EN

This paper presents the methods of fabricating narrow parallel submicrometric stripes in silicon dioxide and a resist layer. The experiments were conducted by two techniques: double patterning lithography and double exposure lithography. In addition to the above mentioned processes, mask translation was applied. For all conducted experiments, chrome masks and a 405 nm line of the high pressure mercury lamp of an MA-56 Mask Aligner System were used. The main aim of the performed tests was to establish the utility and the possible applications of the methods used.

Keywords

EN

optical lithography; double exposure lithography; double pattering lithography; optical mask shifting

• Journal: Open Physics
• Year: 2013
• Volume: 11
• Issue: 2
• Pages: 219-225

Dates

published

1 - 2 - 2013

online

9 - 2 - 2013

Contributors

author

Kornelia Indykiewicz

• Faculty of Microsystems Electronics and Photonics, Wrocław University of Technology, ul. Janiszewskiego 11/17, 50 - 372, Wrocław, Poland,

author

Marcin Hajłasz

• Faculty of Microsystems Electronics and Photonics, Wrocław University of Technology, ul. Janiszewskiego 11/17, 50 - 372, Wrocław, Poland

author

Bogdan Paszkiewicz

• Faculty of Microsystems Electronics and Photonics, Wrocław University of Technology, ul. Janiszewskiego 11/17, 50 - 372, Wrocław, Poland

References

• [1] R. Doering, Y. Nishi, Handbook of Semiconductor Manufacturing Technology, 2nd edition (CRC Press, Taylor and Francic Group, New York, 2008)
• [2] W. M. Moreau, Semiconductor Lithography, Principles, practices, and materials, 1st edition (Plenum Press, New York and London, 1988) http://dx.doi.org/10.1007/978-1-4613-0885-0[Crossref]
• [3] Y. Wei, R. L. Brainard, Advanced Processes for 193-nm Immersion Lithography, 1st edition (SPIE, Bellingham, Washington, 2009) http://dx.doi.org/10.1117/3.820233[Crossref]
• [4] H. J. Levinson, Principles of Lithography, 3rd edition (SPIE, Bellingham, Washington, 2010)
• [5] M. Dusa, W. Arnold, A. Pici, ISSM 2005 IEEE International Symposium on Semiconductor Manufacturing, 13–15 Sept. 2005, 177
• [6] S. Lee. et al., Optical Microlithography XXIProc. of SPIE 6924, 69242A (2008)

Identifiers

DOI

10.2478/s11534-012-0166-0