Distributions of electric parameters in MOS structures on 3C-SiC substrate

• Authors: Krzysztof Piskorski , Henryk Przewlocki , Romain Esteve , Mietek Bakowski
• Languages of publication: EN

Abstracts

EN

In this work studies of some electrical parameters of the MOS structure based on 3C-SiC substrate are presented. The effective contact potential difference ϕMS, the barrier height at the gate-dielectric interface E
BG and the flat-band in semiconductor voltage V
FB were measured using several electric and photoelectric techniques. Values of these parameters obtained on structures with different gate areas decrease monotonically with increasing parameter R, defined as the ratio of the gate perimeter to the gate area. Such behavior confirmed results obtained on MOS structures on silicon substrate and also supported our hypothesis that the mechanical stress in the dielectric layer under the metal gate causes non uniform distribution of some parameters over the gate area of MOS structure.

Keywords

EN

silicon carbide; MOS structure; barrier height; photoelectric measurements

• Journal: Open Physics
• Year: 2013
• Volume: 11
• Issue: 2
• Pages: 231-238

Dates

published

1 - 2 - 2013

online

9 - 2 - 2013

Contributors

author

Krzysztof Piskorski

• Institute of Electron Technology, Al. Lotnikow 32/46, 02-668, Warsaw, Poland,

author

Henryk Przewlocki

• Institute of Electron Technology, Al. Lotnikow 32/46, 02-668, Warsaw, Poland

author

Romain Esteve

• ACREO AB, Electrum 236, SE-164 40, Kista, Sweden

author

Mietek Bakowski

• ACREO AB, Electrum 236, SE-164 40, Kista, Sweden

References

• [1] H. Morkoc, S. Strite, G. B. Gao, M.E. Lin, B. Sverdlov, M. Burns, J. Appl. Phys. 76, 1363 (1994) http://dx.doi.org/10.1063/1.358463[Crossref]
• [2] M. Ruff, H. Mitlehner, R. Helbig, IEEE T. Electron Dev. 41, 1040 (1994) http://dx.doi.org/10.1109/16.293319[Crossref]
• [3] M. Shur, SiC parameters handbook, http://www.ioffe.ru/SVA/NSM/Semicond/SiC
• [4] R. Schorner, P. Friedrichs, D. Peters, IEEE T. Electron Dev. 46, 533 (1999) http://dx.doi.org/10.1109/16.748873[Crossref]
• [5] S. M. Hu, J. Appl. Phys. 70, R53 (1991) http://dx.doi.org/10.1063/1.349282[Crossref]
• [6] I. de Wolf, H.E. Maes, S.K. Jones, J. Appl. Phys. 79, 7148 (1996) http://dx.doi.org/10.1063/1.361485[Crossref]
• [7] K. F. Dombrowski, I. de Wolf, B. Dietrich, J. Appl. Phys. 75, 2450 (1999)
• [8] C. H. Bjorkman, J. T. Fitch, G. Lucovsky, Appl. Phys. Lett. 56, 1983 (1990) http://dx.doi.org/10.1063/1.103228[Crossref]
• [9] H. M. Przewlocki, H. Z. Massoud, J. Appl. Phys. 92, 2198 (2002) http://dx.doi.org/10.1063/1.1489499[Crossref]
• [10] A. Kudla, H.M. Przewlocki, L. Borowicz, D. Brzezinska, W. Rzodkiewicz, Thin Solid Films 450, 203 (2004) http://dx.doi.org/10.1016/j.tsf.2003.10.147[Crossref]
• [11] H. M. Przewlocki, A. Kudla, D. Brzezinska, H. Z. Massoud, Microelectron. Eng. 72, 165 (2004) http://dx.doi.org/10.1016/j.mee.2003.12.031[Crossref]
• [12] H. M. Przewlocki, A. Kudla, D. Brzezinska, H. Z. Massoud, J. Telecommun. Inf. Technol. 1, 34 (2005)
• [13] K. Piskorski, H. M. Przewlocki, Bull. Pol. Acad. Sci.-Te. 54, 461 (2006)
• [14] K. Piskorski, H. M. Przewlocki, J. Telecommun. Inf. Technol. 3, 49 (2007)
• [15] H. M. Przewlocki, A. Kudla, K. Piskorski, D. Brzezinska, Thin Solid Films 516, 4184 (2008) http://dx.doi.org/10.1016/j.tsf.2007.11.005[Crossref]
• [16] S. Porebski, P. Machalica, J. Zajac, L. Borowicz, A. Kudla, H. M. Przewlocki, IEE Proc.-Sci. Meas. Technol. 150, 148 (2003) http://dx.doi.org/10.1049/ip-smt:20030623[Crossref]
• [17] E. H. Nicollian, J. R. Brews, MOS Physics and Technology (J. Wiley, New York, 1982)
• [18] H. M. Przewlocki, J. Appl. Phys. 85, 6610 (1999) http://dx.doi.org/10.1063/1.370169[Crossref]
• [19] H. M. Przewlocki, Solid State Electron. 45, 1241 (2001) http://dx.doi.org/10.1016/S0038-1101(00)00274-4[Crossref]
• [20] A. Jakubowski, H. M. Przewlocki, S. Krawczyk, Rev. Phys. Appl. 17, 473 (1982) http://dx.doi.org/10.1051/rphysap:01982001708047300[Crossref]
• [21] R. H. Fowler, Phys. Rev. 38, 45 (1931) http://dx.doi.org/10.1103/PhysRev.38.45[Crossref]
• [22] V. V. Afanas’ev, Internal Photoemission Spectroscopy. Principles and Applications (Elsevier, Amsterdam, 2008)
• [23] E. D. Palik et al., Handbook of optical constants of solids (Academic Press Handbook Series, Orlando Fl., 1985)
• [24] O. S. Heavens, Optical properties of thin solid films (Academic Press, New York, 1955)
• [25] C. N. Berglund, R. J. Powell, J. Appl. Phys. 40, 5093 (1969) http://dx.doi.org/10.1063/1.1657358[Crossref]

Identifiers

DOI

10.2478/s11534-012-0116-x