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Journal
2011 | 9 | 2 | 404-409
Article title

Creation of high resolution pattern by nanoscratching

Content
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Languages of publication
EN
Abstracts
EN
The lithography is a basic microelectronic process which determines properties of fabricated device. The resolution of optical lithography applied nowadays is insufficient for creating high resolution patterns such as gate electrode in transistors. The scaling ability is the major motivation for undertaking experiments to elaborate high resolution lithography techniques. The atomic force microscope (AFM) is commonly used as tool for creation patterns in sub-micrometers resolution. In this paper, the results of simulations of electromagnetic field behavior during passing the gap with a size smaller than the wavelength of the optical lithography light source are presented. Also results of the nanoscratching lithography prepared for various parameters of force that are applied to the tip are summarized.
Keywords
Publisher

Journal
Year
Volume
9
Issue
2
Pages
404-409
Physical description
Dates
published
1 - 4 - 2011
online
20 - 2 - 2011
Contributors
  • Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17 Street, 50-372, Wrocław, Poland
author
  • Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17 Street, 50-372, Wrocław, Poland
  • Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17 Street, 50-372, Wrocław, Poland
author
  • Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17 Street, 50-372, Wrocław, Poland
  • Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17 Street, 50-372, Wrocław, Poland
  • Institute of Physics, Wrocław University of Technology, Wybrzeże Wyspiańskiego 27, 50-370, Wrocław, Poland
  • Institute of Physics, Wrocław University of Technology, Wybrzeże Wyspiańskiego 27, 50-370, Wrocław, Poland
  • Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17 Street, 50-372, Wrocław, Poland
References
  • [1] X.N. Xie, H.J. Chung, C.H. Sow, A.T.S. Wee, Mater. Sci. Eng. R. 54, 1 (2006) http://dx.doi.org/10.1016/j.mser.2006.10.001[Crossref]
  • [2] Y.D. Yan, T. Sun, S. Dong, Wear 262, 477 (2007) http://dx.doi.org/10.1016/j.wear.2006.06.017[Crossref]
  • [3] Y.J. Chen, J.H. Hsu, H.N. Lin, Nanotechnology 16, 1112 (2005) http://dx.doi.org/10.1088/0957-4484/16/8/020[Crossref]
  • [4] S. Hu et al., J. Vac. Sci. Technol. B 16, 2822 (1998) http://dx.doi.org/10.1116/1.590277[Crossref]
  • [5] E. Dubois, J.L. Bubbendor, Solid State Electron. 43, 1085 (1999) http://dx.doi.org/10.1016/S0038-1101(99)00029-5[Crossref]
  • [6] R. Magno, B.R. Bennett, Appl. Phys. Lett. 70, 1855 (1997) http://dx.doi.org/10.1063/1.118712[Crossref]
  • [7] X. Li, P. Nardi, C. Beak, J. Kim, Y. Kim, J. Micromech. Microeng. 15, 551 (2005) http://dx.doi.org/10.1088/0960-1317/15/3/016[Crossref]
  • [8] X. Li, X. Wang, Q. Xiong, P. Eklund, Appl. Phys. Lett. 87, 233113 (2005) http://dx.doi.org/10.1063/1.2139991[Crossref]
  • [9] M. Ramiączek-Krasowska, A. Szyszka, J. Prażmowska, R. Paszkiewicz, M. Tłaczała, Opt. Appl. 39, 711 (2009)
Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.-psjd-doi-10_2478_s11534-010-0115-8
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