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Number of results

Journal

2009 | 7 | 2 | 291-294

Article title

STM investigation of cobalt silicide nanostructures’ growth on Si(111)-(√19 Ã- √19) substrate

Content

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Languages of publication

EN

Abstracts

EN
Continuing miniaturization of electronic devices necessarily requires assembly of several different objects or devices in a small space. Therefore, besides thin films growth, the possibility of fabricating wires and dots [1, 2] at the nanometre scale composed of metal silicides is of the top interest. This report is about the STM/STS investigation of cobalt silicides’ nanostructures created on Si(111)-(√19 Ã- √19) substrates via Co evaporation and post deposition annealing. This (√19 Ã- √19) reconstruction was induced by Ni doping. Less than 1ML of Co on surface was obtained. Surface reconstruction induced growth of agglomerates of clusters rather than an uniform layer. The post deposition annealing of a crystal sample (up to 670 K, 770 K, 870 K, 970 K, 1070 K and 1170 K) led to creation of silicides’ nanostructures. Measurements showed that coalescence of Co nanoislands begun around 970 K. Annealing above 1070 K led to alloying of a Co, Ni and Si. As a consequence the Si(111)-(7Ã-7) reconstruction occurred at the cost of Si(111)-(√19 Ã- √19).

Keywords

EN

Contributors

author
  • Institute of Physics, Faculty of Technical Physics, Poznan University of Technology, Nieszawska 13A, 60-965, Poznan, Poland
  • Institute of Physics, Faculty of Technical Physics, Poznan University of Technology, Nieszawska 13A, 60-965, Poznan, Poland
  • Institute of Physics, Faculty of Technical Physics, Poznan University of Technology, Nieszawska 13A, 60-965, Poznan, Poland

References

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Document Type

Publication order reference

Identifiers

YADDA identifier

bwmeta1.element.-psjd-doi-10_2478_s11534-008-0141-y
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