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Article title

Practical precursor aspects for electron beam induced deposition

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The purity of a structure made with electron
beam induced deposition (EBID) is a the major concern
when creating micro and nano-scale functionalities,
for example for rapid prototyping. Substantial research
focuses on the improvements of the purity using chemical
vapor deposition (CVD) based precursors. However, from a
practical point of view, many other aspects of a precursor
are very relevant in the design of a process and the actual
use of a tool for EBID. To a large extent, these precursorrelated
characteristics will determine whether or not
a precursor can successfully be applied. Some of these
characteristics include: vapor pressure range, transition
behavior, chemical stability, pyrolitic thresholds,
release of corrosive ligands during deposition, toxicity,
commercial availability, compatibility with the instrument
and operator safety. These characteristic are discussed
in more detail here in order to understand what an ideal
EBID precursor may be. Although some parameters
such as toxicity or flammability seem less important,
in practice they can be a road block for application unless
the main instrument, such as a regular scanning electron
microscope (SEM), is adapted accordingly.
Physical description
14 - 3 - 2014
17 - 7 - 2014
7 - 8 - 2014
  • FEI Company, Achtseweg Noord 5, 5600MD Eindhoven, The Netherlands
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