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Journal
2004 | 2 | 1 | 147-159
Article title

Fowler-nordheim tunnelling in Au−TiO2−Ag film structures

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EN
Abstracts
EN
I-V-characteristics have been measured for Au−TiO2−Ag structures with TiO2 layers of 30 and 180 nm thickness. The TiO2 films were grown by atomic layer deposition (ALD) technique. In the case of negative bias on the Au electrode, the conduction currents through TiO2 layers follow the Fowler-Nordheim formula for field emission over several orders of magnitude. The bulk of the currents may be attributed to tunnelling, seemingly through a Schottky barrier at the Au−TiO2 junction. In the case of reversed polarity the currents are also observed, but cannot be interpreted as tunnelling.
Publisher
Journal
Year
Volume
2
Issue
1
Pages
147-159
Physical description
Dates
published
1 - 3 - 2004
online
1 - 3 - 2004
References
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Document Type
Publication order reference
YADDA identifier
bwmeta1.element.-psjd-doi-10_2478_BF02476278
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