Ion flux's pressure dependence in an asymmetric capacitively coupled rf discharge in NF3

• Authors: Emil Mateev , Ivan Zhelyazkov
• Languages of publication: EN

Abstracts

EN

Starting from an analytical macroscopic/phenomenological model yielding the self-bias voltage as a function of the absorbed radio-frequency (rf) power of an asymmetric capacitively coupled discharge in NF3 this paper studies the dependence of the ion flux onto the powered electrode on the gas pressure. An essential feature of the model is the assumption that the ions' drift velocity in the sheath near the powered electrode is proportional to E
α, where E=−ΔU (U being the self-bias potential), and α is a coefficient depending on the gas pressure and cross section of elastic ion-neutral collisions. The model also considers the role of γ-electrons, stochastic heating as well as the contribution of the active electron current to the global discharge power balance. Numerically solving the model's basic equations one can extract the magnitude of the ion flux (at three different gas pressures) in a technological etching device (Alcatel GIR 220) by using easily measurable quantities, notably the self-bias voltage and absorbed rf power.

Keywords

EN

capacitive discharges; ion fluxes; stochastic heating; 52.40.Kh; 52.70.Gw; 52.80.Pi

• Publisher: De Gruyter Open
• Journal: Open Physics
• Year: 2004
• Volume: 2
• Issue: 1
• Pages: 1-11

Dates

published

1 - 3 - 2004

online

1 - 3 - 2004

Contributors

author

Emil Mateev

• Institute of Electronics, Bulgarian Academy of Sciences, 72 Tsarigradsko Chausse Blvd, BG-1784, Sofia, Bulgaria

author

Ivan Zhelyazkov

• Faculty of Physics, Sofia University, 5 James Bourchier Blvd, BG-1164, Sofia, Bulgaria

References

• [1] E. Mateev, I. Zhelyazkov: “Nonprobe radio-frequency diagnostics method based on the power balance in an asymmetric capacitively coupled discharge”, J. Appl. Phys., Vol. 87, (2000), pp. 3263–3269. http://dx.doi.org/10.1063/1.372334[Crossref]
• [2] E. Mateev, I. Zhelyazkov: “Macroscopic model for energy balance of an asymmetric capacitively coupled rf discharge”, J. Phys. D: Appl. Phys., Vol. 32, (1999), pp. 3019–3024. http://dx.doi.org/10.1088/0022-3727/32/23/307[Crossref]
• [3] V. A. Godyak, N. Sternberg: “Smooth plasma-sheath transition in a hydrodynamical model”, IEEE Trans. Plasma Sci., Vol. 18, (1990), pp. 159–168. http://dx.doi.org/10.1109/27.45519[Crossref]
• [4] V. Godyak, N. Sternberg: “On the consistency of the collisionless sheath model”, Phys. Plasmas., Vol. 9, (2002), pp. 4427–4430. http://dx.doi.org/10.1063/1.1513155[Crossref]
• [5] J. Reece Roth: Industrial Plasma Engineering, Volume 1: Principles, Institute of Physics, Bristol, 1995.
• [6] W. H. Press, S. A. Teukolsky, W. T. Vetterling, B. P. Flannery: Numerical Recipes in FORTRAN, 2nd edition, Cambridge University Press, Cambridge, 1992.

Identifiers

DOI

10.2478/BF02476269