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Journal
2015 | 2 | 1 |
Article title

Patterning of Quantum Dots by Dip-Pen and Polymer Pen Nanolithography

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EN
Abstracts
EN
We present a direct way of patterning CdSe/
ZnS quantum dots by dip-pen nanolithography and
polymer pen lithography. Mixtures of cholesterol and
phospholipid 1,2-dioleoyl-sn-glycero-3 phosphocholine
serve as biocompatible carrier inks to facilitate the transfer
of quantum dots from the tips to the surface during
lithography. While dip-pen nanolithography of quantum
dots can be used to achieve higher resolution and smaller
pattern features (approximately 1 μm), polymer pen
lithography is able to address intermediate pattern scales
in the low micrometre range. This allows us to combine
the advantages of micro contact printing in large area and
massive parallel patterning, with the added flexibility in
pattern design inherent in the DPN technique.
Publisher

Journal
Year
Volume
2
Issue
1
Physical description
Dates
received
2 - 11 - 2014
online
6 - 5 - 2015
accepted
9 - 2 - 2015
Contributors
author
  • Institute of Nanotechnology
    (INT) and Karlsruhe Nano Micro Facility (KNMF), Karlsruhe
    Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen,
    Germany
  • Laboratory for Bio- and Nano- Instrumentation
    (LBNI), Ecole Polytechnique Federale De Lausanne (EPFL), CH-1015
    Lausanne, Switzerland
  • Institute of Nanotechnology
    (INT) and Karlsruhe Nano Micro Facility (KNMF), Karlsruhe
    Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen,
    Germany
author
  • Institute of Nanotechnology
    (INT) and Karlsruhe Nano Micro Facility (KNMF), Karlsruhe
    Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen,
    Germany
author
  • Institute of Nanotechnology
    (INT) and Karlsruhe Nano Micro Facility (KNMF), Karlsruhe
    Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen,
    Germany
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Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.-psjd-doi-10_1515_nanofab-2015-0002
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