Properties of atmospheric pressure plasma oxidized layers on silicon wafers

• Authors: Dana Skácelová , Petr Sládek , Pavel Sťahel , Lukáš Pawera , Martin Haničinec , Jürgen Meichsner , Mirko Černák
• Languages of publication: EN

Abstracts

EN

Keywords

EN

Amorphous silicon oxide; atmospheric pressure plasma; oxidation; DCSBD

• Publisher: De Gruyter Open
• Journal: Open Chemistry
• Year: 2015
• Volume: 13
• Issue: 1

Dates

online

26 - 11 - 2014

received

31 - 1 - 2014

accepted

8 - 5 - 2014

Contributors

author

Dana Skácelová

• Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic

author

Petr Sládek

• Department of Physics, Faculty of Education, Masaryk University, Poříčí 7, 603 00, Brno, Czech Republic

author

Pavel Sťahel

• Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic

author

Lukáš Pawera

• Department of Physics, Faculty of Education, Masaryk University, Poříčí 7, 603 00, Brno, Czech Republic

author

Martin Haničinec

• Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic

author

Jürgen Meichsner

• Institute of Physics, University of Greifswald, Felix-Hausdorff-Strasse 6, 17487, Greifswald, Germany

author

Mirko Černák

• Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic

References

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Identifiers

DOI

10.1515/chem-2015-0047