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2015 | 13 | 1 |
Article title

Properties of atmospheric pressure plasma oxidized layers on silicon wafers

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EN
Abstracts
EN
In this research a new process of plasma oxidation of crystalline silicon at room temperature is studied. The plasma oxidation was carried out using Diffuse Coplanar Surface Barrier Discharge (DCSBD) operating in ambient air and oxygen at atmospheric pressure. The influence of exposition time, plasma parameters and crystallographic orientation of silicon on oxidized layers and their dielectric properties were investigated. Thickness, structure and morphology of these layers were studied by ellipsometry, infrared absorption spectroscopy and scanning electron microscopy. During the treatment time, from 1 to 30 minutes, oxidized layers were obtained with thickness from 1 to 10 nm. Their roughness depends on the crystallographic orientation of silicon surface and exposure time. Electrical parameters of the prepared layers indicate the presence of an intermediate layer between silicon substrate and the oxidized layer.
EN
Publisher

Journal
Year
Volume
13
Issue
1
Physical description
Dates
online
26 - 11 - 2014
received
31 - 1 - 2014
accepted
8 - 5 - 2014
Contributors
  • Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic
author
  • Department of Physics, Faculty of Education, Masaryk University, Poříčí 7, 603 00, Brno, Czech Republic
author
  • Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic
  • Department of Physics, Faculty of Education, Masaryk University, Poříčí 7, 603 00, Brno, Czech Republic
  • Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic
  • Institute of Physics, University of Greifswald, Felix-Hausdorff-Strasse 6, 17487, Greifswald, Germany
  • Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic
References
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Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.-psjd-doi-10_1515_chem-2015-0047
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