Full-text resources of PSJD and other databases are now available in the new Library of Science.
Visit https://bibliotekanauki.pl

PL EN


Preferences help
enabled [disable] Abstract
Number of results

Journal

2006 | 4 | 1 | 73-86

Article title

Influence of interdiffusion on the electrical conductivity of multilayered metal films

Content

Title variants

Languages of publication

EN

Abstracts

EN
The annealing-time dependence of the electrical conductivity of multilayered single-crystal and polycrystalline metal films has been analyzed theoretically within the frame of the semi-classical approach. It is demonstrated that changes in the electrical conductivity which are caused by the diffusion annealing allow for investigating the processes of the bulk and grain-boundary diffusion, and for estimating the coefficients of the diffusion. The electrical conductivity was calculated and the numerical analysis of the diffusion-annealing time dependence was performed at various parameters.

Publisher

Journal

Year

Volume

4

Issue

1

Pages

73-86

Physical description

Dates

published
1 - 3 - 2006
online
1 - 3 - 2006

Contributors

  • Physical-Technical Faculty, Sumy State University, R.-Corsakova, 2, 40007, Sumy, Ukraine

References

  • [1] A.D. Vasil'ev: “Low-Temperature Diffusion in Polycrystalline Pd-Ag Thin Film System”, JTF Lett., Vol. 29, (2003), pp. 60–61.
  • [2] S.V. Gudenko and I.P. Krylov: “Radio-frequency size effect in the scattering of electrons by the boundary of a diffuse layer of impurities”, JETF Lett., Vol. 28, (1978), pp. 224–227.
  • [3] S.V. Gudenko and I.P. Krylov: “Radio-frequency size effect under the impurity diffusion”, Sov. Phys. JETF, Vol. 59, (1984), pp. 1343–1354.
  • [4] Yu.A. Kolesnichenko: “Influence of diffusing impurity layer on conductivity of thin metal plates”, Sov. J. Low Temp. Phys., Vol. 12, (1986), pp. 358–363.
  • [5] Yu.A. Kolesnichenko: “Influence of diffusing impurity layer on rf-properties of thin metal plates”, Sov. J. Low Temp. Phys., Vol. 11, (1985), pp. 641–646.
  • [6] V.F. Koval', V.I. Vatamanyuk, Yu.S. Ostroukhov and O.A. Panchenko: “Influence of Al atoms diffusion on magnetoresistivty of thin Co plates”, Sov. J. Low Temp. Phys., Vol. 12, (1986), pp. 500–501.
  • [7] R.P. Volkova, L.S. Palatnik and A.T. Pugachev: “A Resistometric Method of Investigating Low-Temperature Grain-Boundary Diffusion in Two-Layer Polycrystalline Films”, Fiz. Tverd. Tela, Vol. 24, (1982), pp. 1161–1165.
  • [8] Yu.A. Volkov, R.P. Volkova and A.T. Pugachev: “Infuence of low concentration gold and silver in the grain boundaries on the electron grain-boundary scattering”, Fiz. Met. Metall., Vol. 62, (1986), pp. 298–302.
  • [9] R.P. Volkova and Yu.A. Volkov: “Investigation of Grain-Boundary Diffusion of Silver in Palladium films”, Metallofiz. Noveishie Tekhnol., Vol. 25, (2003), pp. 727–734.
  • [10] L.V. Dekhtyaruk and Yu.A. Kolesnichenko: “Influence of interdiffusion on electric conductivity of two-layer metal plates”, Sov. Phys. Met. Metall., Vol. 75, (1993), pp. 474–481.
  • [11] L.V. Dekhtyaruk, Yu.A. Kolesnichenko and V.G. Peschansky: “Kinetic phenomena in metallic multilayers”, Physics Reviews, Vol. 20, (2004), pp. 3–113.
  • [12] M.I. Kaganov and V.B. Fiks: “To the theory of electromechanical forces in metals”, Sov. Phys. JETF, Vol. 46, (1977), pp. 393–399.
  • [13] V.V. Ustinov: “Contribution of flat defects in electrical resistivity of metals”, Fiz. Met. Metalloved., (1980), Vol. 49, pp. 31–38.
  • [14] A.F. Mayadas and M. Shatzkes: “Electrical - resistivity model for polycrystalline films: the case of arbitrary reflection at external surfaces”, Phys. Rev. B, Vol. 1, (1970), pp. 1382–1389. http://dx.doi.org/10.1103/PhysRevB.1.1382[Crossref]
  • [15] O.A. Bilous, L.V. Dekhtyaruk and A.M. Chornous: “Kinetic size effects in polycrystalline Cu - Nimetal films”, Metallofiz. Noveishie Tekhnol., Vol. 23, (2001), pp. 43–50.
  • [16] L.V. Dekhtyaruk, S.I. Protcenko, A.M. Chornous and I.O. Shpetnyi: “Conductivity and the temperature coefficient of resistance of two - layer polycrystalline films”, Ukr. J. Phys., Vol. 49, (2004), pp. 587–597.
  • [17] A.I. Raichenko: Mathematical Theory of Diffusion in Applications, Naukova Dumka, Kiev, 1981, pp. 1–394.
  • [18] L.V. Dekhtyaruk and Yu.A. Kolesnichenko: “Kinetic coefficients of metal multilayers”, Ukr. Fiz. Zh., Vol. 42, (1997), pp. 1094–1101.
  • [19] J.M. Poate, K.N. Tu and J.W. Mayer: Thin Films - Interdiffusion and Reactions, Wiley Interscience, New York, 1978, pp. 1–576.
  • [20] J.C.M. Hwang and R.W. Balluffi: “Measurement of grain-boundary diffusion at low temperatures by the surface accumulation method. I. Method and analysis”, J. Appl. Phys., Vol. 50, (1979), pp. 1339–1348. http://dx.doi.org/10.1063/1.326168[Crossref]
  • [21] J.C.M. Hwang, J.D. Pan and R.W. Balluffi: “Measurement of grain-boundary diffusion at low temperature by the surface-accumulation method. II. Results for gold-silver system”, J. Appl. Phys., Vol. 50, (1979), pp. 1349–1359. http://dx.doi.org/10.1063/1.326115[Crossref]
  • [22] J.W. Chan, J.P. Pan and R.W. Balluffi: “Diffussion induced grain boundary migration”, Scripta Met., Vol. 13, (1979), pp. 503–509. http://dx.doi.org/10.1016/0036-9748(79)90078-4[Crossref]
  • [23] J. Kaur and W. Gust: Fundamentals of grain and interphase boundary diffusion, Wiley, Chichester, 1995, UK.
  • [24] J.C. Fisher: “Calculation of Diffusion Penetration Curves for Surface and Grain Boundary Diffusion”, J. Appl. Phys., Vol. 22, (1951), pp. 74–77. http://dx.doi.org/10.1063/1.1699825[Crossref]
  • [25] S.M. Klotsman: “Impurity States and Diffusion in Grain Boundaries of Metals”, Usp.Fiz Nauk, Vol. 160, (1990), pp. 99–139.

Document Type

Publication order reference

Identifiers

YADDA identifier

bwmeta1.element.-psjd-doi-10_1007_s11534-005-0007-5
JavaScript is turned off in your web browser. Turn it on to take full advantage of this site, then refresh the page.